Modeling of the electron motion in a capacitively coupled magnetic null plasma

Author

Sung, Youl-Moon ; Okraku-Yirenkyi, Yaw ; Otsubo, Masahisa ; Honda, Chikahisa ; Uchino, Kiichiro ; Muraoka, Katsunori

Author_Institution

Dept. of Electr. & Electron. Eng., Miyazaki Univ., Japan

Volume

30

Issue

1

fYear

2002

fDate

2/1/2002 12:00:00 AM

Firstpage

142

Lastpage

143

Abstract

A new type of plasma system based on the neutral loop discharge (NLD) concept is being developed for research aimed at sputtering application. This system is characterized by plasma production around the multinull magnetic field on the target surface, where a capacitive RF electric field is applied. From the results of the electron motion modeling in this system, we found that electrons around the magnetic null region on the target surface moved in meandering orbits like in the original NLD concept. Initial modeling results on electron behavior and a photograph of plasma emission taken from the new NLD system are presented

Keywords

plasma materials processing; plasma production; plasma transport processes; sputtering; capacitive RF electric field; capacitively coupled magnetic null plasma; capacitively coupled plasma; electron behavior; electron meandering motion; electron motion; electron motion modeling; magnetic null-field neutral loop discharge plasma; multinull magnetic field; neutral loop discharge concept; plasma emission; plasma production; sputtering application; target surface; Atomic measurements; Couplings; Electrons; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma temperature; Radio frequency; Sputtering;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2002.1003964

Filename

1003964