DocumentCode :
753418
Title :
Modeling of the electron motion in a capacitively coupled magnetic null plasma
Author :
Sung, Youl-Moon ; Okraku-Yirenkyi, Yaw ; Otsubo, Masahisa ; Honda, Chikahisa ; Uchino, Kiichiro ; Muraoka, Katsunori
Author_Institution :
Dept. of Electr. & Electron. Eng., Miyazaki Univ., Japan
Volume :
30
Issue :
1
fYear :
2002
fDate :
2/1/2002 12:00:00 AM
Firstpage :
142
Lastpage :
143
Abstract :
A new type of plasma system based on the neutral loop discharge (NLD) concept is being developed for research aimed at sputtering application. This system is characterized by plasma production around the multinull magnetic field on the target surface, where a capacitive RF electric field is applied. From the results of the electron motion modeling in this system, we found that electrons around the magnetic null region on the target surface moved in meandering orbits like in the original NLD concept. Initial modeling results on electron behavior and a photograph of plasma emission taken from the new NLD system are presented
Keywords :
plasma materials processing; plasma production; plasma transport processes; sputtering; capacitive RF electric field; capacitively coupled magnetic null plasma; capacitively coupled plasma; electron behavior; electron meandering motion; electron motion; electron motion modeling; magnetic null-field neutral loop discharge plasma; multinull magnetic field; neutral loop discharge concept; plasma emission; plasma production; sputtering application; target surface; Atomic measurements; Couplings; Electrons; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma temperature; Radio frequency; Sputtering;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2002.1003964
Filename :
1003964
Link To Document :
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