Bending loss reduction in silica-based waveguides by using lateral offsets

Author

Kitoh, Tsutomu ; Takato, Norio ; Yasu, Mitsuho ; Kawachi, Masao

Author_Institution

NTT Opto-Electron. Labs., Ibaraki, Japan

Volume

13

Issue

4

fYear

1995

fDate

4/1/1995 12:00:00 AM

Firstpage

555

Lastpage

562

Abstract

The excess loss that occurs in waveguide bends can be minimized by offsetting the connecting waveguides so as to reduce the transition loss at the junctions. Such bends were investigated in detail by employing the beam propagation method (BPM) and it was found that they can be optimized with respect to overall loss. In the addition, the S-shaped waveguides and directional couplers with offset junctions were fabricated based on silica-based planar lightwave circuits (PLC) on silicon substrates. The measured insertion losses of these S-shaped waveguides and directional couplers, which are in good agreement with the calculated results, are the lowest thus far reported

Keywords

bending; integrated optoelectronics; optical couplers; optical directional couplers; optical loss measurement; optical losses; optical waveguide theory; silicon compounds; S-shaped waveguides; SiO₂; beam propagation method; bending loss reduction; connecting waveguides; directional couplers; excess loss; lateral offsets; measured insertion losses; offset junctions; overall loss; silica-based planar lightwave circuit fabrication; silica-based waveguides; silicon substrates; transition loss; waveguide bends; Circuits; Directional couplers; Joining processes; Optical propagation; Optimization methods; Planar waveguides; Programmable control; Propagation losses; Waveguide junctions; Waveguide transitions;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.372465

Filename

372465