Title :
Bending loss reduction in silica-based waveguides by using lateral offsets
Author :
Kitoh, Tsutomu ; Takato, Norio ; Yasu, Mitsuho ; Kawachi, Masao
Author_Institution :
NTT Opto-Electron. Labs., Ibaraki, Japan
fDate :
4/1/1995 12:00:00 AM
Abstract :
The excess loss that occurs in waveguide bends can be minimized by offsetting the connecting waveguides so as to reduce the transition loss at the junctions. Such bends were investigated in detail by employing the beam propagation method (BPM) and it was found that they can be optimized with respect to overall loss. In the addition, the S-shaped waveguides and directional couplers with offset junctions were fabricated based on silica-based planar lightwave circuits (PLC) on silicon substrates. The measured insertion losses of these S-shaped waveguides and directional couplers, which are in good agreement with the calculated results, are the lowest thus far reported
Keywords :
bending; integrated optoelectronics; optical couplers; optical directional couplers; optical loss measurement; optical losses; optical waveguide theory; silicon compounds; S-shaped waveguides; SiO2; beam propagation method; bending loss reduction; connecting waveguides; directional couplers; excess loss; lateral offsets; measured insertion losses; offset junctions; overall loss; silica-based planar lightwave circuit fabrication; silica-based waveguides; silicon substrates; transition loss; waveguide bends; Circuits; Directional couplers; Joining processes; Optical propagation; Optimization methods; Planar waveguides; Programmable control; Propagation losses; Waveguide junctions; Waveguide transitions;
Journal_Title :
Lightwave Technology, Journal of
