• DocumentCode
    754029
  • Title

    Physics-based modeling of submicron GaN permeable base transistors

  • Author

    Camarchia, Vittorio ; Bellotti, Enrico ; Goano, Michele ; Ghione, Giovanni

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Boston Univ., MA, USA
  • Volume
    23
  • Issue
    6
  • fYear
    2002
  • fDate
    6/1/2002 12:00:00 AM
  • Firstpage
    303
  • Lastpage
    305
  • Abstract
    We present the first physics-based nonstationary modeling of a submicron GaN permeable base transistor. Three different transport models are compared: drift-diffusion, energy balance, and ensemble Monte Carlo. Transport parameters and relaxation times used by the carrier transport equations are consistently derived from particle simulation. The current-voltage (I-V) characteristics predicted with the energy balance model are in good agreement with those obtained from direct Monte Carlo device simulation. On the other hand, the drift-diffusion approach appears to be inadequate for the device under study, even if improved high-field mobility models are adopted.
  • Keywords
    III-V semiconductors; Monte Carlo methods; Schottky gate field effect transistors; carrier mobility; carrier relaxation time; gallium compounds; permeable base transistors; semiconductor device models; wide band gap semiconductors; GaN; carrier transport; current-voltage characteristics; drift-diffusion model; energy balance model; ensemble Monte Carlo model; high-field mobility; particle simulation; physical nonstationary model; relaxation time; submicron GaN permeable base transistor; vertical MESFET; wide bandgap semiconductor; Electromagnetic compatibility; Equations; Gallium nitride; Hydrodynamics; MESFETs; Monte Carlo methods; Piezoelectric films; Predictive models; Production; Semiconductor process modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2002.1004216
  • Filename
    1004216