• DocumentCode
    754143
  • Title

    Hysteresis in transfer characteristics in 4H-SiC depletion/accumulation-mode MOSFETs

  • Author

    Chatty, K. ; Banerjee, S. ; Chow, T.P. ; Gutmann, R.J.

  • Volume
    23
  • Issue
    6
  • fYear
    2002
  • fDate
    6/1/2002 12:00:00 AM
  • Firstpage
    330
  • Lastpage
    332
  • Abstract
    Hysteresis in room-temperature transfer characteristics between forward (pinch-off voltage, V/sub P/=-15 V) and reverse gate voltage sweeps (V/sub P/=7 V) in n-channel depletion/accumulation-mode 4H-SiC MOSFETs is reported. Transfer characteristics exhibit a parallel shift toward negative voltages depending,on the starting gate voltage and direction of the sweep. The hysteresis and shift in transfer characteristics are related to changes in effective fixed-oxide charge resulting from changes in interface trap occupancy. Interface trap occupancy changes depending on the magnitude of the starting gate voltage and the direction of gate-voltage sweep. At high temperatures, the hysteresis between forward and reverse gate voltage sweep decreases.
  • Keywords
    hysteresis; interface states; power MOSFET; silicon compounds; wide band gap semiconductors; 4H-SiC MOSFETs; SiC; depletion/accumulation-mode MOSFETs; effective fixed-oxide charge; gate voltage sweep direction; interface trap occupancy; n-channel MOSFETs; reverse gate voltage sweeps; room-temperature transfer characteristics; starting gate voltage; transfer characteristics hysteresis; Annealing; Argon; Forward contracts; Hysteresis; MOSFETs; Material properties; Silicon carbide; Temperature; Transconductance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2002.1004225
  • Filename
    1004225