DocumentCode :
754143
Title :
Hysteresis in transfer characteristics in 4H-SiC depletion/accumulation-mode MOSFETs
Author :
Chatty, K. ; Banerjee, S. ; Chow, T.P. ; Gutmann, R.J.
Volume :
23
Issue :
6
fYear :
2002
fDate :
6/1/2002 12:00:00 AM
Firstpage :
330
Lastpage :
332
Abstract :
Hysteresis in room-temperature transfer characteristics between forward (pinch-off voltage, V/sub P/=-15 V) and reverse gate voltage sweeps (V/sub P/=7 V) in n-channel depletion/accumulation-mode 4H-SiC MOSFETs is reported. Transfer characteristics exhibit a parallel shift toward negative voltages depending,on the starting gate voltage and direction of the sweep. The hysteresis and shift in transfer characteristics are related to changes in effective fixed-oxide charge resulting from changes in interface trap occupancy. Interface trap occupancy changes depending on the magnitude of the starting gate voltage and the direction of gate-voltage sweep. At high temperatures, the hysteresis between forward and reverse gate voltage sweep decreases.
Keywords :
hysteresis; interface states; power MOSFET; silicon compounds; wide band gap semiconductors; 4H-SiC MOSFETs; SiC; depletion/accumulation-mode MOSFETs; effective fixed-oxide charge; gate voltage sweep direction; interface trap occupancy; n-channel MOSFETs; reverse gate voltage sweeps; room-temperature transfer characteristics; starting gate voltage; transfer characteristics hysteresis; Annealing; Argon; Forward contracts; Hysteresis; MOSFETs; Material properties; Silicon carbide; Temperature; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2002.1004225
Filename :
1004225
Link To Document :
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