Title :
Spectral Loss Characterization of Femtosecond Laser Written Waveguides in Glass With Application to Demultiplexing of 1300 and 1550 nm Wavelengths
Author :
Eaton, Shane M. ; Chen, Wei-Jen ; Zhang, Haibin ; Iyer, Rajiv ; Li, Jianzhao ; Ng, Mi Li ; Ho, Stephen ; Aitchison, J. Stewart ; Herman, Peter R.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON
fDate :
5/1/2009 12:00:00 AM
Abstract :
Femtosecond laser written waveguides in glass were characterized across the full telecom spectrum to gain insight into waveguide loss mechanisms, and to aid in the design of a low-loss 1300/1550 nm wavelength demultiplexer. A lambda-4 wavelength scaling of propagation loss confirms Rayleigh scattering as a principal loss mechanism. Laser exposure was optimized for generating low-loss directional couplers with high isolation between the 1300 and 1550 nm bands. Dispersive coupling in the straight and curved wavelength regions was balanced with a 1.5-fold difference in 1300 and 1550 nm beat lengths, leading to the first demonstration of 1300/1550 nm demultiplexer written with a laser. A minimum interaction length of 3.2 mm, ~2 dB insertion loss and channel isolations of 16.7 and 18.8 dB are reported.
Keywords :
Rayleigh scattering; demultiplexing equipment; high-speed optical techniques; integrated optics; optical directional couplers; optical glass; optical losses; optical waveguides; Rayleigh scattering; beat lengths; channel isolations; femtosecond laser written waveguides; full telecom spectrum; glass; insertion loss; laser exposure; low-loss directional couplers; principal loss mechanism; propagation loss; spectral loss; waveguide loss mechanisms; wavelength 1300 nm to 1550 nm; wavelength demultiplexer; Demultiplexing; Directional couplers; Dispersion; Glass; Optical coupling; Optical design; Propagation losses; Rayleigh scattering; Telecommunications; Waveguide lasers; Buried optical waveguides; Rayleigh scattering; directional couplers; femtosecond laser writing; wavelength demultiplexers;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2008.2005117