Title :
Analysis and design of integrated optical mirrors in planar waveguide technology
Author :
Wiechmann, Stefan ; Heider, H.J. ; Müller, Jörg
Author_Institution :
Dept. of Micro Syst. Technol., Tech. Univ. of Hamburg-Harburg, Hamburg, Germany
fDate :
6/1/2003 12:00:00 AM
Abstract :
We demonstrate integrated optical mirrors in alumina-based waveguides on oxidized silicon substrates. The finite-element method (FEM) is employed for the design of mirrors operating between 1.31 and 1.55 μm at both fundamental polarizations. Excellent agreement between measurement and simulation is achieved for the dispersion behavior of the device. The highly polarization-dependent scattering loss at the reflecting interface is well predicted considering approximate values for the reactive ion etching (RIE) process induced surface roughness.
Keywords :
finite element analysis; light scattering; mirrors; optical design techniques; optical losses; optical planar waveguides; optical waveguide theory; sputter etching; substrates; 1.31 to 1.55 micron; alumina-based waveguides; dispersion behavior; finite-element method; fundamental polarizations; highly polarization-dependent scattering loss; induced surface roughness; integrated optical mirrors; mirrors; optical planar waveguide technology; oxidized silicon substrates; reactive ion etching process; reflecting; Finite element methods; Integrated optics; Mirrors; Optical design; Optical planar waveguides; Optical polarization; Optical scattering; Optical waveguides; Planar waveguides; Silicon;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2003.812463
