Title :
ICCD Imaging of Coexisting Arc Roots and Arc Column in a Large-Area Dispersed Arc-Plasma Source
Author :
Zhou, He-Ling ; Li, Lin-cun ; Cheng, Liang ; Zhou, Zhi-Peng ; Bai, Bing ; Xia, Wei-Dong
Author_Institution :
Dept. of Thermal Sci. & Energy Eng., Univ. of Sci. & Technol. of China, Hefei
Abstract :
Arc attachments to cathode, as well as to anode, had been investigated with the bulk arc plasma between the coaxial electrodes with short-exposure-time ICCD imaging. The images captured suggests that multiple cathodic spots and diffuse attachment to the anode and cathode might contribute to the stability of rotating annular plasma dispersed by strong external coaxial magnetic field.
Keywords :
anodes; arcs (electric); cathodes; plasma diagnostics; plasma flow; plasma instability; plasma radiofrequency heating; plasma sources; anode; arc column; arc roots; cathode; coaxial electrodes; diffuse attachment; external coaxial magnetic field; large-area dispersed arc-plasma source; multiple cathodic spots; rotating annular plasma stability; short-exposure-time ICCD imaging; Arc plasma; ICCD imaging; diffuse arc root; large-area plasma; multiple arc root;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2008.923895
