DocumentCode
754228
Title
ICCD Imaging of Coexisting Arc Roots and Arc Column in a Large-Area Dispersed Arc-Plasma Source
Author
Zhou, He-Ling ; Li, Lin-cun ; Cheng, Liang ; Zhou, Zhi-Peng ; Bai, Bing ; Xia, Wei-Dong
Author_Institution
Dept. of Thermal Sci. & Energy Eng., Univ. of Sci. & Technol. of China, Hefei
Volume
36
Issue
4
fYear
2008
Firstpage
1084
Lastpage
1085
Abstract
Arc attachments to cathode, as well as to anode, had been investigated with the bulk arc plasma between the coaxial electrodes with short-exposure-time ICCD imaging. The images captured suggests that multiple cathodic spots and diffuse attachment to the anode and cathode might contribute to the stability of rotating annular plasma dispersed by strong external coaxial magnetic field.
Keywords
anodes; arcs (electric); cathodes; plasma diagnostics; plasma flow; plasma instability; plasma radiofrequency heating; plasma sources; anode; arc column; arc roots; cathode; coaxial electrodes; diffuse attachment; external coaxial magnetic field; large-area dispersed arc-plasma source; multiple cathodic spots; rotating annular plasma stability; short-exposure-time ICCD imaging; Arc plasma; ICCD imaging; diffuse arc root; large-area plasma; multiple arc root;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2008.923895
Filename
4544814
Link To Document