• DocumentCode
    754262
  • Title

    Measurement of the effect of self-heating in strained-silicon MOSFETs

  • Author

    Jenkins, K.A. ; Rim, K.

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    23
  • Issue
    6
  • fYear
    2002
  • fDate
    6/1/2002 12:00:00 AM
  • Firstpage
    360
  • Lastpage
    362
  • Abstract
    The self-heating of strained-silicon MOSFETs is demonstrated experimentally. Output characteristics measured by a pulse technique, in which self-heating is absent, show as much as 15% greater drain current (for 15% Ge content) than the corresponding static measurements. Comparison of the current measured this way with the static measurements allows an estimate of the channel temperature during the static operation. The temperature rise is compared to a simple estimate of the thermal resistance of the FET.
  • Keywords
    Ge-Si alloys; MOSFET; heating; silicon-on-insulator; thermal resistance; SOI; Si-SiGe; current-voltage curves; lattice mismatch; output characteristics; pulsed I-V method; self-heating effect; strained-silicon MOSFET; temperature rise; thermal healing length; Current measurement; Electrical resistance measurement; FETs; Germanium silicon alloys; MOSFETs; Pulse measurements; Silicon germanium; Temperature; Thermal resistance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2002.1004235
  • Filename
    1004235