DocumentCode
754262
Title
Measurement of the effect of self-heating in strained-silicon MOSFETs
Author
Jenkins, K.A. ; Rim, K.
Author_Institution
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
23
Issue
6
fYear
2002
fDate
6/1/2002 12:00:00 AM
Firstpage
360
Lastpage
362
Abstract
The self-heating of strained-silicon MOSFETs is demonstrated experimentally. Output characteristics measured by a pulse technique, in which self-heating is absent, show as much as 15% greater drain current (for 15% Ge content) than the corresponding static measurements. Comparison of the current measured this way with the static measurements allows an estimate of the channel temperature during the static operation. The temperature rise is compared to a simple estimate of the thermal resistance of the FET.
Keywords
Ge-Si alloys; MOSFET; heating; silicon-on-insulator; thermal resistance; SOI; Si-SiGe; current-voltage curves; lattice mismatch; output characteristics; pulsed I-V method; self-heating effect; strained-silicon MOSFET; temperature rise; thermal healing length; Current measurement; Electrical resistance measurement; FETs; Germanium silicon alloys; MOSFETs; Pulse measurements; Silicon germanium; Temperature; Thermal resistance; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2002.1004235
Filename
1004235
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