DocumentCode :
755605
Title :
Characterization of soot from multimode vapor-phase axial deposition (VAD) optical fiber performs
Author :
Potkay, E. ; Clark, H.R. ; Smyth, I.P. ; Kometani, T.Y. ; Wood, D.L.
Author_Institution :
AT&T Labs., Princeton, NJ, USA
Volume :
6
Issue :
8
fYear :
1988
fDate :
8/1/1988 12:00:00 AM
Firstpage :
1338
Lastpage :
1347
Abstract :
Composition, degree of crystallinity, particle size, and soot packing density of a multimode VAD porous sootform fabricated under optimum standard processing conditions were evaluated with 1-mm radial resolution using several analytical methods. The methods include inductively coupled plasma emission spectroscopy, the X-ray diffraction powder method, a simple mass/volume calculation, and transmission electron microscopy. Within individual particulate, the GeO2 and SiO2 appear as separate phases as opposed to a compound glass. The degree of fusion observed in the particle aggregates indicates that the soot packing density profile is established by a surface sintering process governed predominantly by the deposition surface temperature distribution. This study has general significance in clarifying the behavior of dopants during various processing steps associated with VAD and other soot processes, including the MVCD (modified chemical vapor deposition) and OVD (outside vapor-phase deposition) lightguide processes
Keywords :
X-ray diffraction examination of materials; electron microscope examination of materials; optical workshop techniques; spectroscopy; vapour deposition; GeO2; MVCD; OVD; SiO2; VAD; X-ray diffraction powder method; degree of crystallinity; lightguide processes; modified chemical vapor deposition; optical fiber performs; outside vapor-phase deposition; particle aggregates; particle size; plasma emission spectroscopy; resolution; soot; soot packing density; surface sintering process; transmission electron microscopy; vapor-phase axial deposition; Couplings; Crystallization; Electron emission; Mass spectroscopy; Plasma density; Plasma materials processing; Plasma x-ray sources; Powders; Transmission electron microscopy; X-ray diffraction;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.4139
Filename :
4139
Link To Document :
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