DocumentCode :
755714
Title :
Photodegradation for a hydrogenated amorphous silicon photoconversion layer in a solid-state image sensor
Author :
Miyagawa, Ryohei ; Furukawa, Akihiko
Author_Institution :
Toshiba Corp., Kawasaki, Japan
Volume :
39
Issue :
2
fYear :
1992
fDate :
2/1/1992 12:00:00 AM
Firstpage :
325
Lastpage :
330
Abstract :
Photodegradation for a hydrogenated amorphous silicon photoconversion layer in a two-level solid-state imaging device was studied. The residual current after a light pulse, which causes image lag for the imaging device, was most sensitive to light exposure among several properties, so that the residual current determines the lifetime for the photoconversion layer. The space charge was also increased with increasing residual current by light exposure, because both properties reflected light-induced defect states. The space charge was found to be a good monitor for the photodegradation. The space-charge density had light intensity and exposure-time dependency, which is similar to that for dangling bond density. The lifetime for the photoconversion layer, which was evaluated through the space-charge density change, was 1.5×107 h under standard illumination for the imager. This lifetime is sufficiently long for practical imager use
Keywords :
CCD image sensors; amorphous semiconductors; elemental semiconductors; hydrogen; silicon; space charge; 1.5E7 h; amorphous Si:H layer; dangling bond density; device lifetime; exposure-time dependency; image lag; photoconversion layer; photodegradation; residual current; semiconductors; solid-state image sensor; space-charge density; Amorphous silicon; Bonding; Electrodes; Image resolution; Image sensors; Lighting; Pixel; Solid state circuits; Space charge; Spontaneous emission;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.121689
Filename :
121689
Link To Document :
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