DocumentCode :
755738
Title :
Thin-film inverted MSM photodetectors
Author :
Vendier, O. ; Jokerst, N.M. ; Leavitt, R.P.
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
8
Issue :
2
fYear :
1996
Firstpage :
266
Lastpage :
268
Abstract :
To improve the external quantum efficiency and maintain the high speed of metal-semiconductor-metal (MSM) photodetectors, a thin film inverted MSM (I-MSM), which is separated from the growth substrate, has fingers on the bottom of the device, and is bonded to a silicon host substrate, is reported for the first time. This device optimizes the tradeoff between speed and responsivity, demonstrating the improvement in responsivity that can be achieved using an I-MSM. The photodetector time domain response at /spl lambda/=1.3 μm is 50 ps FWHM, with a 34 ps rise time and a 85 ps fall time.
Keywords :
integrated optics; metal-semiconductor-metal structures; optical films; optimisation; photodetectors; 1.3 mum; 34 ps; 50 ps; 85 ps; external quantum efficiency; fall time; growth substrate; high speed; metal-semiconductor-metal photodetectors; photodetector time domain response; responsivity; rise time; silicon host substrate; speed; thin-film inverted MSM photodetectors; Capacitance; Computer aided manufacturing; Electrodes; Fingers; Integrated circuit packaging; Lighting; PIN photodiodes; Photodetectors; Shadow mapping; Transistors;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.484262
Filename :
484262
Link To Document :
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