DocumentCode :
755787
Title :
Comparison of Simple Approximations and Numerical Solutions for the Threshold Voltage of Ion-Implanted Long-Channel MOSFET´s
Author :
Brodfuehrer, Brian P. ; Galloway, Kenneth F. ; Wilson, Charles L.
Volume :
27
Issue :
1
fYear :
1984
Firstpage :
3
Lastpage :
6
Abstract :
The very simple approximations used for calculating the threshold voltage shifts for ion-implanted long-channel MOSFET´s in classroom discussions are compared to the results of a more exact numerical simulation. Limited experimental measurements are compared to the calculated threshold voltage shifts.
Keywords :
Channel bank filters; Doping profiles; Implants; MOSFET circuits; NIST; Numerical simulation; Physics; Poisson equations; Silicon; Threshold voltage;
fLanguage :
English
Journal_Title :
Education, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9359
Type :
jour
DOI :
10.1109/TE.1984.4321649
Filename :
4321649
Link To Document :
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