DocumentCode :
755835
Title :
Explaining the amplitude of RTS noise in submicrometer MOSFETs
Author :
Simoen, Eddy ; Dierickx, Bart ; Claeys, Cor L. ; Declerck, Gilbert J.
Author_Institution :
IMEC, Leuven, Belgium
Volume :
39
Issue :
2
fYear :
1992
fDate :
2/1/1992 12:00:00 AM
Firstpage :
422
Lastpage :
429
Abstract :
A simple-man´s model for the random telegraph signal (RTS) noise amplitude in a submicrometer MOSFET is presented. It is shown that the channel resistance modulation for a specific trap can be expressed as a product of the normalized scattering cross section and of the fractional conductivity change. The model qualitatively describes the experimental temperature and drain current dependence of the RTS amplitude and allows evaluation of the influence of the trap location and nature on the wide scatter in values observed
Keywords :
electron device noise; insulated gate field effect transistors; semiconductor device models; MOSFETs; RTS noise; channel resistance modulation; drain current dependence; fractional conductivity change; normalized scattering cross section; random telegraph signal noise; submicrometer; temperature dependence; trap location influence; 1f noise; Amplitude estimation; Conductivity; Fluctuations; Helium; MOSFETs; Noise level; Scattering; Telegraphy; Temperature dependence;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.121702
Filename :
121702
Link To Document :
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