Title :
Single-Facet Folded-Cavity Diode Laser With Ultrasmall Bend Radius High-Index-Contrast Oxidized AlGaAs Ridge Waveguide
Author :
Liang, Di ; Wang, Jusong ; Hall, Douglas C.
Author_Institution :
Dept. of Electr. Eng., Notre Dame Univ., IN
fDate :
4/15/2007 12:00:00 AM
Abstract :
AlGaAs heterostructure high-index-contrast (HIC) ridge waveguide (RWG) diode lasers incorporating a folded-cavity single-facet resonator with a folding bend radius as small as r=10 mum are demonstrated. Fabricated by a self-aligned deep dry etch (through the active region) plus nonselective O2-enhanced wet thermal oxidization process, the low-index, insulating, and interface-passivating wet thermal oxide grown directly on the etch-exposed AlGaAs waveguide sidewalls yields a high lateral refractive index contrast of Deltan~1.7 and provides strong optical mode confinement. The HIC RWG device geometry also completely eliminates lateral current spreading, which results in an excellent overlap between the optical field and the gain region of the single InAlGaAs quantum-well graded-index separate confinement heterostructure. A threshold current of Ith=65mA is obtained for the r=10 mum device (a half-racetrack ring resonator), giving a threshold current density of Jth=1503 A/cm2, 3.34 times higher than that of same-length straight lasers. At a bend radius of r=150 mum, Ith=16.6 mA, and Jth is comparable to straight cavity values, indicating that at this curvature there is negligible bending and scattering loss for the lowest-order waveguide mode
Keywords :
III-V semiconductors; aluminium compounds; current density; etching; gallium arsenide; laser cavity resonators; optical fabrication; oxidation; passivation; quantum well lasers; refractive index; ridge waveguides; waveguide lasers; 10 mum; 150 mum; 16.6 mA; 65 mA; AlGaAs; AlGaAs ridge waveguide; deep dry etching; folded-cavity diode laser; folding bend radius; high-index-contrast; interface-passivation; single-facet resonator; threshold current density; wet thermal oxidation; Diode lasers; Dry etching; Optical refraction; Optical resonators; Optical ring resonators; Optical scattering; Optical variables control; Optical waveguides; Threshold current; Wet etching; Integrated optoelectronics; materials processing; ring resonators; semiconductor lasers; semiconductor waveguides;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2007.893907