DocumentCode :
756175
Title :
Breakdown voltage of field plate and field-limiting ring techniques: numerical comparison
Author :
Goud, C. Basavana ; Bhat, K.N.
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol., Madras, India
Volume :
39
Issue :
7
fYear :
1992
fDate :
7/1/1992 12:00:00 AM
Firstpage :
1768
Lastpage :
1770
Abstract :
Using the recently developed two-dimensional simulator STAAB, the breakdown voltage of the field plate and field-limiting ring junction termination techniques is numerically compared for various values of junction depth, lateral width, and oxide fixed charge. The computed results demonstrate the superiority of the field plate technique over the field-limiting ring technique for planar shallow-junction high-voltage devices, both discrete and integrated
Keywords :
digital simulation; electric breakdown of solids; monolithic integrated circuits; semiconductor devices; semiconductor junctions; 2D simulator; STAAB; field plate; field-limiting ring; high-voltage devices; junction depth; junction termination techniques; lateral width; oxide fixed charge; planar shallow-junction; two-dimensional simulator; Computational modeling; Contacts; Councils; Dielectrics; Doping profiles; Ionization; Meteorological radar; Permittivity;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.141246
Filename :
141246
Link To Document :
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