• DocumentCode
    757550
  • Title

    Vacuum arc ion sources: recent developments and applications

  • Author

    Brown, Ian ; Oks, Efim

  • Author_Institution
    Lawrence Berkeley Nat. Lab., CA, USA
  • Volume
    33
  • Issue
    6
  • fYear
    2005
  • Firstpage
    1931
  • Lastpage
    1943
  • Abstract
    The vacuum arc ion source has evolved over the past 20 years into a standard laboratory tool for the production of high current beams of metal ions, and is now used in a number of different embodiments at many laboratories around the world. The primary application of this kind of source has evolved to be ion implantation for material surface modification. Another important use is for injection of high current beams of heavy metal ions into the front ends of particle accelerators, and much excellent work has been carried out in recent years in optimizing the source for reliable accelerator application. The source also provides a valuable tool for the investigation of the fundamental plasma physics of vacuum arc plasma discharges. As the use of the source has grown and diversified, at the same time, the ion source performance and operational characteristics have been improved in a variety of different ways also. Here we review the growth and status of vacuum arc ion sources around the world and summarize some of the applications for which the sources have been used.
  • Keywords
    plasma accelerators; plasma immersion ion implantation; plasma sources; reviews; vacuum arcs; ion implantation; material surface modification; metal ion beams; particle accelerators; plasma discharges; plasma physics; review; vacuum arc ion sources; Ion beams; Ion sources; Laboratories; Plasma accelerators; Plasma applications; Plasma immersion ion implantation; Plasma properties; Plasma sources; Production; Vacuum arcs; Cathode spot; ion implantation; ion source; metal ion beam; vacuum arc;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2005.860088
  • Filename
    1556678