• DocumentCode
    758322
  • Title

    Bent-beam strain sensors

  • Author

    Gianchandani, Yogesh B. ; Najafi, Khalil

  • Author_Institution
    Center for Integrated Sensors & Circuits, Michigan Univ., Ann Arbor, MI, USA
  • Volume
    5
  • Issue
    1
  • fYear
    1996
  • fDate
    3/1/1996 12:00:00 AM
  • Firstpage
    52
  • Lastpage
    58
  • Abstract
    We examine a new class of sensitive and compact passive strain sensors that utilize a pair of narrow bent beams with an apex at their mid-points. The narrow beams amplify and transform deformations caused by residual stress into opposing displacements of the apices, where vernier scales are positioned to quantify the deformation. An analytical method to correlate vernier readings to residual stress is outlined, and its results are corroborated by finite-element modeling. It is shown that tensile and compressive residual stress levels below 10 MPa, corresponding to strains below 6×10-5 can be measured in a 1.5-μm-thick layer of polysilicon using a pair of beams that are 2 μm wide, 200 μm long, and bent 0.05 radians (2.86°) to the long axis of the device. Experimental data is presented from bent-beam strain sensors that were fabricated from boron-doped single crystal silicon using the dissolved wafer process and from polycrystalline silicon using surface micromachining. Measurements from these devices agree well with those obtained by other methods
  • Keywords
    elemental semiconductors; finite element analysis; micromachining; microsensors; silicon; strain sensors; 1.5 micron; 2 micron; 200 micron; Si; bent-beam strain sensors; compressive residual stress levels; deformation quantification; dissolved wafer process; finite-element modeling; polysilicon; surface micromachining; tensile residual stress levels; vernier scales; Bridge circuits; Capacitive sensors; Mechanical variables measurement; Microstructure; Residual stresses; Silicon; Strain measurement; Stress measurement; Structural beams; Tensile strain;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/84.485216
  • Filename
    485216