Title :
Inhibition of bird´s beak in LOCOS by new buffer N2O oxide
Author :
Chao, T.S. ; Cheng, J.Y. ; Lei, T.F.
Author_Institution :
Nat. Nano Device Lab., Hsinchu, Taiwan
fDate :
2/16/1995 12:00:00 AM
Abstract :
A new N2O buffer oxide was used to replace the conventional dry oxide for LOCOS isolation. This new structure can result in a shorter bird´s beak than the conventional structure without adding extra steps and inducing the defect in silicon substrate
Keywords :
isolation technology; nitridation; nitrogen compounds; oxidation; silicon; LOCOS; N2O-Si; Si; bird´s beak inhibition; buffer N2O oxide; isolation; silicon substrate;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19950208
