DocumentCode :
758637
Title :
Threshold voltage and subthreshold slope of multiple-gate SOI MOSFETs
Author :
Colinge, J.P. ; Park, J.W. ; Xiong, W.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California, Davis, CA, USA
Volume :
24
Issue :
8
fYear :
2003
Firstpage :
515
Lastpage :
517
Abstract :
The subthreshold swing and threshold voltage characteristics of multiple-gate SOI transistors have been numerically simulated. These devices behave like cylindrical, surrounding gate devices, with the exception of the corner inversion effect. The corner inversion effect is, however, shown to be negligible if the devices are fully depleted devices or if the gate insulator thickness is small enough.
Keywords :
MOSFET; inversion layers; silicon-on-insulator; corner inversion effect; fully depleted devices; gate insulator thickness; multiple-gate SOI MOSFETs; subthreshold slope; threshold voltage; Doping; FETs; Insulation; MOS devices; MOSFETs; Numerical simulation; Semiconductor device modeling; Semiconductor films; Silicon on insulator technology; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2003.815153
Filename :
1218659
Link To Document :
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