DocumentCode :
758662
Title :
A multiple-terminal gate charging model
Author :
Lin, Wallace
Author_Institution :
Intel Corp., Santa Clara, CA, USA
Volume :
24
Issue :
8
fYear :
2003
Firstpage :
521
Lastpage :
523
Abstract :
A gate charging model considering charging effect at all terminals of a MOSFET is reported in this letter. The model indicates two distinct charging mechanisms existing in P MOSFETs with a protecting device at their gates during plasma processing. The "normal-mode" charging mechanism exists when antenna size at the gate is higher than that at other terminals combined. In contrast, the "reverse-mode" charging mechanism exists in the case of antenna size at the gate lower than that at other terminals combined. The normal-mode mechanism will dominate the charging event when there is no protecting device at the transistor gate or the protecting device provides very low leakage current. On the other hand, the reverse-mode mechanism becomes dominant if the protecting device provides very high leakage current. The normal-mode charging mechanism is limited by the N-well junction leakage while in the reverse-mode mechanism, it is limited by the leakage of the protecting device. The model also suggests that larger N-well junction gives rise to higher charging damage in the normal-mode mechanism while it is opposite in the reverse-mode mechanism. These were confirmed by experimental data. The model points out that a zero charging damage can be achieved at certain combinations of the gate, source, drain and N-well antenna ratio. The knowledge of these transistor terminal antenna-ratio combinations will maximize the effective usage of the charging protection devices in circuit design. The reverse-mode charging mechanism suggests that the use of a high-leakage device at the transistor gate for charging protection may cause an opposite effect when the transistor terminal antenna ratios run into a condition that triggers this mechanism. This implies that PMOS transistors with gate intentionally pinned at ground or low potential in circuits may be prone to charging damage depending on the connectivity of their source, drain, and NW.
Keywords :
MOSFET; leakage currents; plasma materials processing; semiconductor process modelling; N-well junction; PMOSFET; antenna ratio; gate oxide damage; leakage current; multiple-terminal gate charging model; normal-mode charging; plasma processing; protecting device; reverse-mode charging; CMOS technology; Circuit synthesis; Diodes; Leakage current; MOSFET circuits; Manufacturing processes; Plasma devices; Plasma materials processing; Plasma sources; Protection;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2003.815151
Filename :
1218661
Link To Document :
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