Title :
Nonlocal effects in thin 4H-SiC UV avalanche photodiodes
Author :
Ng, B.K. ; David, John P R ; Tozer, Richard C. ; Rees, Graham J. ; Yan, Feng ; Zhao, Jian H. ; Weiner, Maurice
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, UK
Abstract :
The avalanche multiplication and excess noise characteristics of 4H-SiC avalanche photodiodes with i-region widths of 0.105 and 0.285 μm have been investigated using 230-365-nm light, while the responsivities of the photodiodes at unity gain were examined for wavelengths up to 375 nm. Peak unity gain responsivities of more than 130 mA/W at 265 nm, equivalent to quantum efficiencies of more than 60%, were obtained for both structures. The measured avalanche characteristics show that β>α and that the β/α ratio remains large even in thin 4H-SiC avalanche regions. Very low excess noise, corresponding to keff<0.15 in the local noise model, where keff=α/β(β/α) for hole (electron) injection, was measured with 365-nm light in both structures. Modeling the experimental results using a simple quantum efficiency model and a nonlocal description yields effective ionization threshold energies of 12 and 8 eV for electrons and holes, respectively, and suggests that the dead space in 4H-SiC is soft. Although dead space is important, pure hole injection is still required to ensure low excess noise in thin 4H-SiC APDs owing to β/α ratios that remain large, even at very high fields.
Keywords :
avalanche photodiodes; impact ionisation; semiconductor device noise; silicon compounds; wide band gap semiconductors; β/α ratio; 230 to 365 nm; 4H-SiC UV avalanche photodiode; 60 percent; SiC; avalanche multiplication; dead space; electron injection; excess noise; hole injection; impact ionization; ionization coefficient; ionization threshold energy; nonlocal effect; quantum efficiency; unity gain responsivity; Avalanche photodiodes; Charge carrier processes; Impact ionization; Noise measurement; Optical materials; Optical noise; Optical receivers; Signal to noise ratio; Silicon carbide; Wavelength measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2003.815144