DocumentCode :
758787
Title :
Analytical solutions to the one-dimensional oxide-silicon-oxide system
Author :
Shi, Xuejie ; Wong, Man
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., China
Volume :
50
Issue :
8
fYear :
2003
Firstpage :
1793
Lastpage :
1800
Abstract :
Analytical solutions to the one-dimensional (1-D) double-side gated oxide-silicon-oxide (OSO) system are derived. The solution space, parameterized by the gate bias conditions, is divided into two separate regions, admitting either a "zero-field" or a "zero-potential" solution. The boundary between the two regions is defined by the "zero-potential and zero-field" solution. Some general implications of the solutions are discussed. The "saturation" values of the body potential for the "zero-field" solution and the body electric field for the "zero-potential" solution are derived. The formalism is also applied to determine a single-gate silicon-on-insulator equivalence of a double-gate metal-oxide-semiconductor capacitor.
Keywords :
electric potential; elemental semiconductors; semiconductor-insulator boundaries; silicon; work function; body electric field; double-side gated system; gate bias conditions; one-dimensional oxide-silicon-oxide system; single-gate silicon-on-insulator equivalence; zero-field; zero-potential; Contacts; Electric potential; Electrodes; Energy states; Equations; Helium; Insulation; MOS capacitors; Metal-insulator structures; Silicon on insulator technology;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.815138
Filename :
1218673
Link To Document :
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