Self-Written Waveguide Optical Pin Fabricated Using Photomask Transfer Method

Author

Hanajima, Hiroshi ; Obata, Yusuke ; Ozawa, Hideaki ; Kanda, Masahiro ; Mikami, Osamu

Author_Institution

Tokai Univ., Kanagawa

Volume

18

Issue

19

fYear

2006

Firstpage

2020

Lastpage

2022

Abstract

This letter reports on a new self-written waveguide (SWW) optical interconnection pin. The SWW-pin is formed directly on an optical device using a photomask transfer method and has a 45deg mirror on the end-face. The processed end-face provides 90deg optical path redirection and enables strict handling and alignment in optical interconnections on an optoelectronic printed-wiring board. We present 90deg path redirection characteristics of an SWW-pin having a coupling loss of 1.1 dB

Keywords

integrated optoelectronics; masks; mirrors; optical fabrication; optical interconnections; optical losses; optical waveguides; coupling loss; end-face mirror; optical device; optical fabrication; optical interconnection pin; optical interconnections; optical path redirection; optical pin; optoelectronic printed-wiring board; path redirection characteristics; photomask transfer method; self-written waveguide; Mirrors; Optical coupling; Optical crosstalk; Optical devices; Optical interconnections; Optical refraction; Optical waveguides; Resins; Vertical cavity surface emitting lasers; Wiring; Optical pin; photomask transfer method; self-written waveguide (SWW)-pin;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2006.882226

Filename

1703622