• DocumentCode
    759579
  • Title

    GaAs pHEMT-based technology for microwave applications in a volume MMIC production environment on 150-mm wafers

  • Author

    O´Keefe, Matthew F. ; Atherton, John S. ; Bösch, Wolfgang ; Burgess, Paul ; Cameron, Nigel I. ; Snowden, Christopher M.

  • Author_Institution
    Filtronic Compound Semicond. Ltd., Durham, UK
  • Volume
    16
  • Issue
    3
  • fYear
    2003
  • Firstpage
    376
  • Lastpage
    383
  • Abstract
    The establishment of a 150-mm (6-in) gallium arsenide (GaAs) facility is described together with the development of very high yielding and cost-effective semiconductor device technologies and a manufacturing capacity of over 40000 wafers/annum. The background to the demand for very high volumes of RF products for this market is discussed, together with the prospects for future growth. The paper describes recent process development by the utilization of a data-driven yield management system to support the delivery of high-quality RF products to customers. Finally, "end of line" DC and RF testing of finished 150-mm GaAs pHEMT foundry wafers is described, enabling scalar measurements of power, noise, and intermodulation products as well as vector measurements of S-parameters and noise parameters at frequencies of up to 40 GHz.
  • Keywords
    HEMT integrated circuits; III-V semiconductors; S-parameters; field effect MMIC; gallium arsenide; integrated circuit manufacture; integrated circuit testing; integrated circuit yield; microwave measurement; production testing; 150 mm; DC testing; GaAs; GaAs PHEMT-based technology; RF products; RF testing; S-parameters measurement; data-driven yield management system; high-volume GaAs facility; high-volume MMIC production environment; intermodulation products; manufacturing capacity; microwave applications; noise measurements; power measurements; scalar measurements; vector measurements; very high yielding technologies; Frequency measurement; Gallium arsenide; MMICs; Microwave devices; Microwave technology; Noise measurement; Power measurement; Production; Radio frequency; Semiconductor device noise;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2003.815631
  • Filename
    1219482