High-Power Copper Gratings for a Sheet-Beam Traveling-Wave Amplifier at G-band

Author

Joye, Colin D. ; Calame, Jeffrey P. ; Cook, Alan M. ; Garven, Morag

Author_Institution

U.S. Naval Res. Lab., Washington, DC, USA

Volume

60

Issue

1

fYear

2013

fDate

Jan. 2013

Firstpage

506

Lastpage

509

Abstract

The design, fabrication, and electromagnetic cold testing results of an all-copper grating circuit intended for a G-band sheet-beam traveling-wave amplifier are presented. Fabrication was carried out via ultraviolet photolithography (UV-LIGA) using the SU-8 photoresists. Two cold test methods used to characterize the microfabricated circuits are reported and reveal excellent agreement with simulations. This type of all-copper grating also shows potential for use as a high-average-power sharp-cutoff filter.

Keywords

LIGA; copper; microfabrication; microwave power amplifiers; photoresists; travelling wave amplifiers; Cu; G-band sheet-beam traveling-wave amplifier; SU-8 photoresists; UV-LIGA; all-copper grating circuit; electromagnetic cold testing method; high-average-power sharp-cutoff filter; high-power copper gratings; microfabricated circuits; ultraviolet photolithography; Annealing; Copper; Dispersion; Fabrication; Gratings; Lithography; Resists; Copper grating; millimeter-wave (mmW) amplifiers; photolithography; slow-wave structures;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/TED.2012.2226591

Filename

6361465