DocumentCode :
763136
Title :
An Effective Channel Mobility-Based Analytical On-Current Model for Polycrystalline Silicon Thin-Film Transistors
Author :
Wang, Mingxiang ; Wong, Man
Author_Institution :
Dept. of Microelectron., Soochow Univ., Suzhou
Volume :
54
Issue :
4
fYear :
2007
fDate :
4/1/2007 12:00:00 AM
Firstpage :
869
Lastpage :
874
Abstract :
A physical-based analytical ON-state drain-current model was developed based on a mobility model including both grain boundary barrier-controlled carrier conduction and gate voltage dependent mobility degradation. Mobility variation along the conduction channel caused by both effects was taken into account. The derived drain-current can be approximated by a previously followed form, however, with mobility term modified and saturation factor included. Our experimental effective channel mobility and above-threshold drain-current data from both low-temperature and high-temperature processed polycrystalline silicon thin-film transistors can be accurately fitted by the model, without introducing any empirical or artificial factors
Keywords :
elemental semiconductors; semiconductor device models; silicon; thin film transistors; Si; barrier-controlled conduction; channel mobility-based analytical on-current model; drain-current modeling; effective channel mobility; gate voltage dependent mobility degradation; grain boundary barrier-controlled carrier conduction; mobility model; physical-based analytical ON-state drain-current model; polycrystalline silicon thin-film transistors; Analytical models; Capacitance measurement; Crystallization; Current measurement; Degradation; Grain boundaries; Silicon; Thermionic emission; Thin film transistors; Voltage; Barrier-controlled conduction; drain–current modeling; e ffective channel mobility; mobility degradation; polycrystalline silicon (poly-Si); thin-film transistors (TFTs);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.891248
Filename :
4142909
Link To Document :
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