2-D analytic model for inductively coupled plasma sources. I. Electromagnetic model and kinetic analysis

Author

Dai, Fa ; Wu, Chwan-Hwa John

Author_Institution

Dept. of Electr. Eng., Auburn Univ., AL, USA

Volume

23

Issue

1

fYear

1995

fDate

2/1/1995 12:00:00 AM

Firstpage

65

Lastpage

73

Abstract

Inductively coupled plasma sources (ICPS) have recently received increasing interest for semiconductor etching and deposition. A 2-D (r, z) electromagnetic (EM) model of ICPS is developed in terms of the mode analysis (MA) technique. Based upon the eigenmode expansion, a closed-form of the vector and scalar potentials of the EM fields is obtained, which provides exact and fast computing for the EM fields in the structure. By means of the Boltzmann-Vlasov equation, a 2-D model is established to describe the kinetic behaviors of plasmas. The closed-form solution for calculating induced space-currents is given, in which a collisionless coupled damping dominates the interaction mechanism between the induced RF wave and plasmas. In this connection, the 2-D coupled damping effect will be analyzed in detail in the following paper

Keywords

Vlasov equation; plasma deposition; plasma kinetic theory; plasma production; semiconductor technology; sputter etching; 2D analytic model; Boltzmann-Vlasov equation; closed-form solution; collisionless coupled damping; deposition; eigenmode expansion; electromagnetic model; induced RF wave; induced space-currents; inductively coupled plasma sources; kinetic analysis; mode analysis technique; scalar potentials; semiconductor etching; vector potentials; Coupled mode analysis; Damping; Electromagnetic analysis; Electromagnetic modeling; Equations; Etching; Kinetic theory; Plasma applications; Plasma sources; Plasma waves;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.376562

Filename

376562