DocumentCode :
764363
Title :
Three-dimensional phototransistors in 3D silicon-on-insulator technology
Volume :
43
Issue :
7
fYear :
2007
Firstpage :
418
Lastpage :
420
Abstract :
Measurement results of phototransistors designed in a three-dimensional (3D) 0.18 mum silicon-on-insulator technology are presented. The phototransistors respond to light intensities of 5-200 000 lux with currents from 50 fA to 2.3 muA. The novelty of this phototransistor is that its photocurrent is proportional to the square of the incident light intensity. The device measurements reported show that the photodetectors can be used for the design of high-density imaging arrays in three-dimensional SOI CMOS fabrication processes
Keywords :
CMOS integrated circuits; photoconductivity; photodetectors; phototransistors; silicon-on-insulator; 0.18 micron; 3D SOI CMOS fabrication processes; 3D phototransistors; 3D silicon-on-insulator technology; 50 fA to 2.3 muA; high-density imaging arrays; light intensities; photocurrent; photodetectors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20073502
Filename :
4145310
Link To Document :
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