• DocumentCode
    764745
  • Title

    ESD investigation of pn junction diodes in silicon-germanium heterojunction bipolar transistor

  • Author

    Chou, C.H. ; Chen, S.S. ; Tang, T.H.

  • Author_Institution
    Div. of Teacher Educ., Providence Univ., Taichung Hsien, Taiwan
  • Volume
    39
  • Issue
    14
  • fYear
    2003
  • fDate
    7/10/2003 12:00:00 AM
  • Firstpage
    1089
  • Lastpage
    1091
  • Abstract
    The electrostatic discharge (ESD) characteristics of the pn junction diodes with different configurations in a silicon-germanium heterojunction bipolar transistor (SiGe HBT) based on a 0.18 μm SiGe BiCMOS process is investigated. From the measured results, for the thin-base SiGe HBT, the base-collector junction diode shows the best ESD performance among all kinds of diode configurations owing to its large junction area.
  • Keywords
    Ge-Si alloys; electrostatic discharge; heterojunction bipolar transistors; p-n junctions; semiconductor materials; 0.18 micron; BiCMOS process; ESD investigation; SiGe; base-collector junction diode; diode configurations; electrostatic discharge characteristics; heterojunction bipolar transistor; junction area; pn junction diodes;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20030677
  • Filename
    1220834