Iron Thin Films by Means of Dual Ion-Beam Sputtering

Dual ion-beam sputtering from high-purity targets was used to form iron thin films with improved magnetic and chemical properties. Films obtained were amorphous according to X-ray diffraction studies, and while Hc increased for ion accelerating voltage Vsg above 140 V, 4¿Ms first increased with increasing Vsg and then fell off. Normal hysteresis loops were obtained for films formed with Vsg = 0 to 115 V, but films formed at 155 V had rotational hysteresis loops. By controlling the energy of ions deposited on the surface, it was possible to form films with a high 4¿Ms (20 kG) and low Hc (1.4 Oe); ion deposition also tended to make film compositions uniform and improve the atomic ordering.