DocumentCode
764949
Title
Preparation of Electron-Beam Evaporated FeAlSi Film
Author
Kadono, M. ; Nago, K. ; Muramatsu, T. ; Yamamoto, T. ; Tsuchimoto, S. ; Yoshikawa, M.
Author_Institution
Sharp Corp., Central Res. Lab., Tenri.
Volume
1
Issue
4
fYear
1985
fDate
7/1/1985 12:00:00 AM
Firstpage
491
Lastpage
492
Abstract
Film compositions were varied during formation of FeAlSi films by electron beam evaporation, and the magnetic properties measured. Films 4 to 5 ¿m thick were formed by evaporating a 4 wt% Al - 27.5 wt% Si - 68.5 wt% Fe tablet onto a photosensitive crystallized glass substrate heated to 400°C, varying the shutter opening/closing time to change the composition. Films were then heat-treated at 600°C. It was found that films with satisfactory properties can be obtained in the range Al = 3 - 5 wt%, Si = 9 - 12 wt%; films were such that Bs = 1.1 - 1.2 T, Hc ¿ 1.0 Oe,¿¿ ≫ 2000, ¿ = 70 ¿¿cm, and ¿s was zero or took on small positive values.
Keywords
Crystallization; Electron beams; Glass; Iron; Magnetic field measurement; Magnetic films; Magnetic flux density; Magnetostriction; Semiconductor films; Substrates;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1985.4548834
Filename
4548834
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