DocumentCode
764960
Title
Magnetic Properties of Fe-Si-Ru Sputtered Films
Author
Shiiki, K. ; Shiroishi, Y. ; Kumasaka, N. ; Aoki, S.
Author_Institution
Central Research Lab., Hitachi Ltd., Tokyo
Volume
1
Issue
4
fYear
1985
fDate
7/1/1985 12:00:00 AM
Firstpage
493
Lastpage
494
Abstract
The authors studied Fe-Si magnetic thin films with Ru added formed on glass substrates by RF sputtering. Addition of Ru tended to lower the saturation magnetic flux density, but the rate of decrease was smaller than for transition metals such as Cr. The permeability and coercive force remained unaffected. Polarization curve measurements and tests using salt sprays indicated that films with Ru added were more resistant to corrosion. Fe-Si-Ru alloys were obtained with a saturation flux density of about 1.7 T, a permeability of about 500 and a corrosive resistance comparable to that of Ni-Fe alloys.
Keywords
Chromium; Coercive force; Glass; Magnetic films; Magnetic flux density; Magnetic properties; Permeability; Polarization; Radio frequency; Sputtering;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1985.4548835
Filename
4548835
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