DocumentCode
764979
Title
Current Density Dependence of Magnetoresistive Effect in NiFe Films
Author
Hosono, K. ; Takagi, H. ; Shiotani, H.
Author_Institution
Fujitsu Laboratories Ltd., Kawasaki
Volume
1
Issue
4
fYear
1985
fDate
7/1/1985 12:00:00 AM
Firstpage
497
Lastpage
499
Abstract
NiFe film samples with positive, negative and zero-valued magnetostrictions were formed by EB evaporation on quartz and BK-7 glass substrates, and the current density dependence of the MR effect was investigated. ¿R-H curves were shaped differently depending on the magnetostriction sign. Hk *, defined as the field value at which the change in resistivity ¿¿ is nearly zero, showed different dependences on the current density Js for different magnetostrictions; ¿¿m decreased with increasing Js for all samples. At certain current densities, both the ¿¿m and Hk * characteristics showed changes in slope, but the Js at which this occurred was different for the two substrates.
Keywords
Conductivity; Current density; Electron beams; Glass; Laboratories; Magnetic films; Magnetics Society; Magnetoresistance; Magnetostriction; Substrates;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1985.4548837
Filename
4548837
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