• DocumentCode
    764979
  • Title

    Current Density Dependence of Magnetoresistive Effect in NiFe Films

  • Author

    Hosono, K. ; Takagi, H. ; Shiotani, H.

  • Author_Institution
    Fujitsu Laboratories Ltd., Kawasaki
  • Volume
    1
  • Issue
    4
  • fYear
    1985
  • fDate
    7/1/1985 12:00:00 AM
  • Firstpage
    497
  • Lastpage
    499
  • Abstract
    NiFe film samples with positive, negative and zero-valued magnetostrictions were formed by EB evaporation on quartz and BK-7 glass substrates, and the current density dependence of the MR effect was investigated. ¿R-H curves were shaped differently depending on the magnetostriction sign. Hk*, defined as the field value at which the change in resistivity ¿¿ is nearly zero, showed different dependences on the current density Js for different magnetostrictions; ¿¿m decreased with increasing Js for all samples. At certain current densities, both the ¿¿m and Hk* characteristics showed changes in slope, but the Js at which this occurred was different for the two substrates.
  • Keywords
    Conductivity; Current density; Electron beams; Glass; Laboratories; Magnetic films; Magnetics Society; Magnetoresistance; Magnetostriction; Substrates;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4548837
  • Filename
    4548837