• DocumentCode
    764986
  • Title

    Magnetic Properties of Permalloy Films By High-Rate Triode Sputtering

  • Author

    Minakata, R. ; Kira, T. ; Yoshikawa, M.

  • Author_Institution
    Sharp Corp., Central Research Lab., Tenri.
  • Volume
    1
  • Issue
    4
  • fYear
    1985
  • fDate
    7/1/1985 12:00:00 AM
  • Firstpage
    500
  • Lastpage
    501
  • Abstract
    Permalloy film was formed by triode sputtering and vacuum-annealed in a magnetic field (150 Oe), and changes in magnetic properties induced by the annealing were studied. The as-sputtered films had a uniaxial magnetic anisotropy, and except for the crystal orientation, films changed little with different sputtering conditions (voltage, Ar pressure). As a result of magnetic field annealing, the film uniaxial anisotropy was maintained up to 300°C, but above 400°C the HcH increased, the anisotropy was lost and soft magnetic characteristics deteriorated. This was attributed to formation of a regular lattice.
  • Keywords
    Anisotropic magnetoresistance; Annealing; Argon; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Sputtering; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4548838
  • Filename
    4548838
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=764986