DocumentCode :
764986
Title :
Magnetic Properties of Permalloy Films By High-Rate Triode Sputtering
Author :
Minakata, R. ; Kira, T. ; Yoshikawa, M.
Author_Institution :
Sharp Corp., Central Research Lab., Tenri.
Volume :
1
Issue :
4
fYear :
1985
fDate :
7/1/1985 12:00:00 AM
Firstpage :
500
Lastpage :
501
Abstract :
Permalloy film was formed by triode sputtering and vacuum-annealed in a magnetic field (150 Oe), and changes in magnetic properties induced by the annealing were studied. The as-sputtered films had a uniaxial magnetic anisotropy, and except for the crystal orientation, films changed little with different sputtering conditions (voltage, Ar pressure). As a result of magnetic field annealing, the film uniaxial anisotropy was maintained up to 300°C, but above 400°C the HcH increased, the anisotropy was lost and soft magnetic characteristics deteriorated. This was attributed to formation of a regular lattice.
Keywords :
Anisotropic magnetoresistance; Annealing; Argon; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Sputtering; Voltage;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1985.4548838
Filename :
4548838
Link To Document :
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