DocumentCode
765435
Title
Dual radio frequency sources in a magnetized capacitively coupled plasma discharge
Author
Rauf, Shahid
Author_Institution
Adv. Products R&D Lab., Motorola Inc., Austin, TX, USA
Volume
31
Issue
4
fYear
2003
Firstpage
471
Lastpage
478
Abstract
Nonlinear interaction of two radio frequency (RF) sources in a magnetized Ar/C2F6 capacitively coupled plasma discharge is investigated using a computational model. Results show that application of a radial magnetic field enhances charged and neutral species densities in the plasma reactor due to reduction in electron loss to surfaces and trapping of secondary electron emission generated electrons. Amplitude of RF currents at electrodes also increases with magnetic field strength and source frequency for a given RF voltage. Due to nonlinear nature of plasma sheath, higher harmonics of applied frequencies and source interaction generated harmonics can be observed in electrode currents. Application of magnetic field decreases electron mobility and makes the system less nonlinear, which reduces higher harmonics relative to primary components. Magnetic field also tends to make the RF sources more isolated. Increase in source frequency moves the plasma from electrode edge to the center of the chamber, which redistributes current through the electrodes. If frequencies of the two RF sources are commensurate, nonlinear interaction of RF sources generates subharmonics of primary frequencies.
Keywords
high-frequency discharges; plasma sheaths; secondary electron emission; computational model; dual radio frequency sources; electrode currents; electron loss; electron mobility; magnetic field strength; magnetized Ar/hexafluoroethane capacitively coupled plasma discharge; magnetized capacitively coupled plasma discharge; nonlinear interaction; nonlinear nature; plasma sheath; radial magnetic field; radio frequency sources; secondary electron emission generated electrons; subharmonics; Couplings; Electrodes; Electron emission; Fault location; Magnetic fields; Plasma applications; Plasma density; Plasma sheaths; Plasma sources; Radio frequency;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2003.815483
Filename
1221814
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