DocumentCode
765519
Title
Distribution of Axes of Easy Magnetization of RE-TM Films: Bias Voltage Dependence
Author
Togami, Y. ; Okamoto, K. ; Sato, R. ; Saito, N.
Author_Institution
NHK Science and Technical Res. Lab., Tokyo
Volume
1
Issue
5
fYear
1985
Firstpage
625
Lastpage
626
Abstract
The authors report the results of experiments to test their hypothesis that the distribution of the easy magnetization axis in magneto-optical recording films (Gd-Tb-Co, Gd-Tb-Co-Fe) depends on the substrate bias voltage Vb during film formation by RF sputtering. Experiments performed for (Gd0.80 Tb0.20 )0.29 (Co0.83 Fe0.17 )0.71 films, none of which had uniaxial anisotropy in a diagonal direction, indicated that the angle of inclination of the easy magnetization axis from the normal to the film, ¿0 , does indeed decrease as Vb is increased.
Keywords
Anisotropic magnetoresistance; Hall effect; Magnetic field measurement; Magnetic films; Magnetization; Magnetooptic effects; Magnetooptic recording; Sputtering; Substrates; Voltage;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1985.4548889
Filename
4548889
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