Title :
Critical Angle Behavior of Exchange Bias and Coercivity in CoFe/MnIr Bilayers
Author :
Kim, Dong Young ; Kim, CheolGi ; Kim, Chong-Oh ; Naka, M. ; Tsunoda, M. ; Takahashi, M.
Author_Institution :
Res. Center for Adv. Magnetic Mater., Chungnam Nat. Univ.
Abstract :
Angular dependence of Hex and Hc, and the critical angle behavior are measured in CoFe/MnIr bilayers annealed at 200degC and 340degC. The interfacial exchange coupling anisotropy and the antiferromagnet anisotropy at tAF<tc AF are estimated from the best fitting of angular dependence of Hex and Hc using Stoner-Wohlfarth (S-W) model. These results confirm existence of interfacial exchange coupling anisotropy between F and AF layers for tAF<tc AF. The measured critical angles for tAF>tc AF as well as for tAF <tc AF are well explained using S-W model
Keywords :
antiferromagnetic materials; cobalt alloys; coercive force; iridium alloys; iron alloys; magnetic anisotropy; manganese alloys; 200 C; 340 C; CoFe-MnIr; S-W model; Stoner-Wohlfarth model; angular dependence; antiferromagnet anisotropy; coercivity; critical AF thickness; critical angle behavior; exchange bias; interfacial exchange coupling anisotropy; Anisotropic magnetoresistance; Annealing; Antiferromagnetic materials; Coercive force; Couplings; Goniometers; Magnetic field measurement; Magnetic materials; Magnetization; X-ray diffraction; Critical AF thickness; Stoner–Wohlfarth model; critical angle; exchange bias and coercivity;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2006.879756
