An improved termination structure for silicon radiation detectors with all-P-type multiguard and cut-line implants

A junction termination structure for silicon radiation detectors is investigated, featuring all-p-type multiguard and scribe-line implants, with metal field-plates providing complete coverage of the oxide upper surface above nonimplanted regions. The sensitive interface between oxide and n-type substrate is thus electrostatically screened from the external environment, resulting in improved long-term stability of the device and excellent insensitivity to ambient conditions both before and after X-ray and neutron irradiations. Careful design of the multiguard layout enables high-voltage operation to be achieved. With respect to a previously proposed structure, the adoption of alternate outward and inward field plates between adjacent rings allows a significant improvement in the voltage handling capability.