Title :
Rapid thermal annealed InGaN/GaN flip-chip LEDs
Author :
Chen, W.S. ; Shei, S.C. ; Chang, S.J. ; Su, Y.K. ; Lai, W.C. ; Kuo, C.H. ; Lin, Y.C. ; Chang, C.S. ; Ko, T.K. ; Hsu, Y.P. ; Shen, C.F.
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Abstract :
Nitride-based flip-chip (FC) light-emitting diodes (LEDs) emitting at 465 nm with Ni transparent ohmic contact layers and Ag reflective mirrors were fabricated. With an incident light wavelength of 465 nm, it was found that transmittance of normalized 300°C rapid thermal annealed (RTA) Ni(2.5 nm) was 93% while normalized reflectance of 300°C RTA Ni(2.5 nm)/Ag(200 nm) was 92%. It was also found that 300°C RTA Ni(2.5 nm) formed good ohmic contact on n+ short-period-superlattice structure with specific contact resistance of 7.8×10-4 Ω·cm2. With 20-mA current injection, it was found that forward voltage and output power were 3.15 V and 16.2 mW for FC LED with 300°C RTA Ni(2.5 nm)/Ag(200 nm). Furthermore, it was found that reliabilities of FC LEDs were good.
Keywords :
III-V semiconductors; contact resistance; flip-chip devices; gallium compounds; indium compounds; light emitting diodes; nickel; rapid thermal annealing; silver; wide band gap semiconductors; 300 C; 465 nm; Ag; InGaN-GaN; Ni; contact resistance; current injection; nitride-based flip-chip light emitting diodes; normalized reflectance; rapid thermal annealing; reflective mirror; superlattice; transmittance; transparent ohmic contact layer; Conducting materials; Fluorescent lamps; Gallium nitride; Gold; Indium tin oxide; Light emitting diodes; Mirrors; Ohmic contacts; Power generation; Rapid thermal annealing; Flip-chip (FC); GaN; light-emitting diodes (LEDs); rapid thermal anneal (RTA); reflective mirrors; transparent ohmic contact;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2005.860760