DocumentCode
766668
Title
Characterization of programmed charge lateral distribution in a two-bit storage nitride flash memory cell by using a charge-pumping technique
Author
Gu, Shaw-Hung ; Wang, Tahui ; Lu, Wen-Pin ; Ting, WenChi ; Ku, Yen-Hui Joseph ; Lu, Chih-Yuan
Author_Institution
Dept. of Electron. Eng., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
Volume
53
Issue
1
fYear
2006
Firstpage
103
Lastpage
108
Abstract
In this paper, we use a modified charge pumping technique to characterize the programmed charge lateral distribution in a hot electron program/hot hole erase, two-bit storage nitride Flash memory cell. The stored charge distribution of each bit over the source/drain junctions can be profiled separately. Our result shows that the second programmed bit has a broader stored charge distribution than the first programmed bit. The reason is that a large channel field exists under the first programmed bit during the second bit programming. Such a large field accelerates channel electrons and causes earlier electron injection into the nitride. In addition, we find that programmed charges spread further into the channel as program/erase cycle number increases.
Keywords
flash memories; hot carriers; charge pumping; cycling stress; drain junction; hot electron; hot hole erase; programmed charge lateral distribution; source junction; two-bit storage nitride flash memory cell; Acceleration; Charge carrier processes; Charge measurement; Charge pumps; Current measurement; Electron traps; Flash memory cells; Hot carriers; SONOS devices; Threshold voltage; Charge pumping (CP); cycling stress; programmed charge distribution; two-bit storage nitride Flash cell;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2005.860632
Filename
1561553
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