Depositions of Co-Cr Films by EP magnetron Sputtering Technique

Fast Co-Cr film deposition speed was obtained using the exposed pole (EP) magnetron sputtering technique. At an Ar gas pressure of 0.2 Pa and an applied power density of 7.6 W/cm², a maximum film deposition speed of 0.18 ¿m/min was obtained. It was found that the film thickness and Co content both decrease monotonically from the center of the substrate outwards. Film thickness and Co content were found to be optimal under low Ar gas pressure and low magnetic field induced by the solenoid coil (Bs).