Preparation Conditions and Characteristics of Sputtered Co-Cr Films

The two facing targets sputtering technique was used to fabricate thin films in an attempt to avoid the disadvantages of the dependence of the c-axis orientation on film thickness in developing films for perpendicular recording media with good perpendicular magnetic properties. It was found that when film formation conditions are optimum, even when film thickness is less than 1000 Å, the Co-Cr sputtered film is formed wvith ¿¿50 less than 3°.