• DocumentCode
    767142
  • Title

    Effect of Annealing on Extraordinary Hall Effects in Sputtered Granular Cu _80 Co _20 Thin Films

  • Author

    Wang, Jian-Qing ; Kim, Nam H.

  • Author_Institution
    Dept. of Phys., Binghamton Univ.
  • Volume
    42
  • Issue
    10
  • fYear
    2006
  • Firstpage
    3282
  • Lastpage
    3284
  • Abstract
    This work explores the nanostructure dependence of extraordinary Hall effect (EHE) in Cu80Co20 granular thin films. Upon annealing, an unusual nanostructure evolution in Cu-Co into two Co particles-size distribution affects the magnetotransport properties, most evidently in the EHE. It was concluded that the EHE in annealed films primarily depends on the population of smaller sized particles. Upon annealing, the EHE field sensitivity was gradually reduced from 0.78 nOmega-cm/Oe for the as-deposited film to 0.04 nOmega-cm/Oe for 400degC annealed one
  • Keywords
    Hall effect; cobalt alloys; copper alloys; discontinuous metallic thin films; magnetic annealing; nanostructured materials; 400 C; Cu80Co20; EHE; annealed granular films; extraordinary Hall effects; field sensitivity; granular thin films; magnetic annealing; magnetotransport properties; nanostructure dependence; particle-size dependence; Annealing; Conductivity; Hall effect; Magnetic field measurement; Magnetic films; Magnetic properties; Magnetic separation; Sputtering; Temperature; Transistors; Annealed granular films; extraordinary Hall effect (EHE); field sensitivity; particle-size dependence;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2006.879744
  • Filename
    1704600
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=767142