• DocumentCode
    767457
  • Title

    The (220) lattice spacing of silicon

  • Author

    Basile, Giuseppe ; Bergamin, Angelo ; Cavagnero, Giovanni ; Mana, Giovanni ; Vittone, Ettore ; Zosi, Gianfranco

  • Author_Institution
    Istituto di Metrol., Torino Univ., Italy
  • Volume
    44
  • Issue
    2
  • fYear
    1995
  • fDate
    4/1/1995 12:00:00 AM
  • Firstpage
    526
  • Lastpage
    529
  • Abstract
    Further details are given of an experiment based on combined X-ray and optical interferometry to measure the (220) lattice spacing of silicon. A resolution of 5×10-9 d220 was achieved and the silicon d220 was determined to 3×10 -8 d220 accuracy. The measured value is d220 =(192015.551±0.005) fm. After correction for the impurity-induced lattice strain, d220=(192015.569±0.006) fm was obtained
  • Keywords
    X-ray applications; crystal structure; data analysis; error analysis; lattice constants; light interferometry; silicon; (220) lattice spacing; X-ray interferometry; correction; data analysis; impurity-induced lattice strain; measurement error analysis; optical interferometry; Error correction; Lattices; Motion measurement; Optical feedback; Optical interferometry; Optical modulation; Optical polarization; Optical recording; Silicon; Time measurement;
  • fLanguage
    English
  • Journal_Title
    Instrumentation and Measurement, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9456
  • Type

    jour

  • DOI
    10.1109/19.377898
  • Filename
    377898
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=767457