DocumentCode :
767649
Title :
Bidirectional m/m Transfer Gates for 4 Mb Ion-Implanted Bubble Devices
Author :
Kato, Y. ; Urai, H.
Author_Institution :
Microelectronics Research Labs., NEC Corporation.
Volume :
1
Issue :
9
fYear :
1985
Firstpage :
1117
Lastpage :
1119
Abstract :
Roles of a compensation conductor on m/m gates for 4 Mb ion-implanted contiguous disk bubble devices were described. The C-loop to S-loop distance was adjusted for gate operation improvement. The compensation conductor cancelled unnecessary magnetic fields near the gate and reduced propagation errors of bubbles near the gate conductor. Bias margins for consecutive transfer operations have been improved even for long data pages.
Keywords :
Annealing; Conducting materials; Conductors; Garnet films; Magnetic fields; Magnetics Society; Microelectronics; National electric code; Space vector pulse width modulation; Testing;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1985.4549091
Filename :
4549091
Link To Document :
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