DocumentCode :
768045
Title :
Analysis of coating thickness variation during optical fiber Processing
Author :
Jiang, Qibo ; Yang, Fuzheng ; Pitchumani, Ranga
Author_Institution :
Dept. of Mech. Eng., Univ. of Connecticut, Storrs, CT, USA
Volume :
23
Issue :
3
fYear :
2005
fDate :
3/1/2005 12:00:00 AM
Firstpage :
1261
Lastpage :
1272
Abstract :
During the mass production of silica-based optical fibers, a large fiber preform is softened in a high-temperature furnace and is drawn to a small fiber with a diameter of about 125 μm. The hot fiber exiting the furnace is cooled rapidly by the surrounding air or by blowing a gas, and is subsequently coated with a polymer layer to provide a protection of the fiber surface. The overall quality of the fiber depends on the uniformity of the coating layer, which is strongly influenced by the manufacturing conditions. While the average thickness of the coating layer is extensively investigated in the literature, the studies on the coating thickness fluctuation lack a sound fundamental basis. In this paper, a linear perturbation analysis is adopted to predict the coating thickness variation under different processing conditions. An experimental correlation is developed to determine the initial amplitude of the thickness disturbance. Numerical results are presented for the first time to directly link the processing and geometric parameters with the coating thickness fluctuation in the final product. The results provide guidelines for selecting coating materials, system designs, and processing parameters to achieve uniform fiber coating layers.
Keywords :
optical fibre fabrication; optical films; optical polymers; perturbation techniques; preforms; coating thickness; high-temperature furnace; linear perturbation analysis; optical fiber processing; polymer layer; silica-based optical fibers; Coatings; Fluctuations; Furnaces; Guidelines; Manufacturing; Mass production; Optical fibers; Polymer films; Preforms; Protection; Coating thickness fluctuation; optical fiber coating; perturbation analysis;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2005.843519
Filename :
1417024
Link To Document :
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