• DocumentCode
    768243
  • Title

    Ion Beam Sputtered Films of Bismuth-Substituted Yttrium Iron Garnet

  • Author

    Okuda, T. ; Hayashi, K. ; Koshizuka, N.

  • Author_Institution
    Electrotechnical Laboratory, Sakura-mura, Ibaraki 305.
  • Volume
    2
  • Issue
    2
  • fYear
    1987
  • Firstpage
    136
  • Lastpage
    137
  • Abstract
    Compared with the conventional liquid phase epitaxy method (LPE), ion beam sputtering (IBS) has advantages in heavy doping of Bi ions, since it is an essentially nonthermal equilibrium process. IBS was used to prepare Bi-substituted YIG films. Epitaxial growth along the {111} direction was observed, however, and small amounts of polycrystalline garnet phase were also found. Bi content of the films reached 2.75/(formula unit). Investigation of the dependences of Faraday rotation on Bi content of the films and on the target composition showed that Faraday rotation reached a maximum of -4.3 × 104 deg/cm, as high as that reported for LPE grown films [1]. Slight contamination of the films by the materials of the ion gun, the grids, iris, wall and target holder was detected.
  • Keywords
    Bismuth; Contamination; Doping; Epitaxial growth; Garnet films; Ion beams; Iris; Iron; Sputtering; Yttrium;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1987.4549350
  • Filename
    4549350