DocumentCode
768280
Title
A hybrid diffraction method for the design of etched diffraction grating demultiplexers
Author
Shi, Zhimin ; He, Jian-Jun ; He, Sailing
Author_Institution
Centre for Opt. & Electromagn. Res., Zhejiang Univ., Hangzhou, China
Volume
23
Issue
3
fYear
2005
fDate
3/1/2005 12:00:00 AM
Firstpage
1426
Lastpage
1434
Abstract
A novel hybrid diffraction method is proposed to simulate the demultiplexing of an etched diffraction grating (EDG). The scalar diffraction formula is adopted to simulate the propagation of the light field in the free propagation region (FPR), and a rigorous coupled-wave analysis (RCWA) is used to calculate the polarization-dependent diffraction near the grating. The hybrid diffraction method takes the advantages of both the conventional scalar diffraction method and the rigorous coupled-wave analysis and can simulate accurately the imaging property as well as the polarization-dependent efficiency of an EDG demultiplexer. Compared with the conventional scalar diffraction method, the proposed hybrid diffraction method reduces greatly the design error in, for example, the polarization-dependent insertion loss.
Keywords
coupled mode analysis; demultiplexing equipment; diffraction gratings; etching; light diffraction; optical design techniques; wavelength division multiplexing; etched diffraction grating demultiplexer design; free propagation region; hybrid diffraction method; polarization-dependent diffraction; polarization-dependent insertion loss; rigorous coupled-wave analysis; scalar diffraction formula; Analytical models; Demultiplexing; Design methodology; Diffraction gratings; Etching; Image analysis; Insertion loss; Optical coupling; Optical polarization; Optical propagation; Demultiplexer; diffraction grating; photonic integrated circuit; rigorous coupled-wave analysis (RCWA); wavelength-division multiplexing (WDM);
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2005.843460
Filename
1417045
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