DocumentCode
768886
Title
Magnetic Characteristics of Fine Permalloy Patterns
Author
Yonekura, Y. ; Yanase, T. ; Majima, T.
Author_Institution
Fujitsu Laboratories, Ltd., Atsugi.
Volume
2
Issue
3
fYear
1987
fDate
3/1/1987 12:00:00 AM
Firstpage
283
Lastpage
284
Abstract
The magnetization behavior of patterned Permalloy film used in bubble memory elements is described. A total of 4.6 à 106 pattern elements were formed in Permalloy film evaporated onto a GGG substrate, spaced at a period of 4.5 ¿m. In-plane magnetization curves showed almost no change when a bias field was applied normal to the film, and patterning resulted in a strong shape effect. The in-plane magnetization curves had bends which were attributed to different magnetization characteristics prevailing in different portions of each pattern.
Keywords
Anisotropic magnetoresistance; Helium; Magnetic field measurement; Magnetic fields; Magnetic films; Magnetic hysteresis; Magnetic susceptibility; Magnetization; Shape; Substrates;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1987.4549408
Filename
4549408
Link To Document