Title :
Low-loss singlemode amorphous silicon waveguides
Author :
Harke, A. ; Krause, M. ; Mueller, J.
Author_Institution :
Dept. of Micro Syst. Technol., Hamburg, Germany
Abstract :
Amorphous silicon waveguides were obtained by plasma-enhanced chemical vapour deposition and anisotropic plasma etching. Rectangular multimode waveguides as well as singlemode ridge waveguides were fabricated. Scattered light measurements at 1550 nm (1300 nm) wavelength showed a low propagation loss of ≤0.5 dB/cm (1.6 dB/cm) for multimode waveguides and 2.0 dB/cm (5.0 dB/cm) for highly-confined singlemode waveguides.
Keywords :
amorphous semiconductors; elemental semiconductors; hydrogen; integrated optics; light scattering; optical waveguides; plasma CVD coatings; rectangular waveguides; ridge waveguides; silicon; sputter etching; 1300 nm; 1550 nm; Si:H; anisotropic plasma etching; low-loss waveguides; plasma enhanced chemical vapour deposition; propagation loss; rectangular multimode waveguides; rectangular waveguide; ridge waveguides; scattered light measurements; singlemode amorphous waveguides;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20052387
